philipp_1971#

H. R. Philipp, “Optical properties of non-crystalline Si, SiO, SiOx and SiO2”, J. Phys. Chem. Solids 32, 1935 (1971)

Source record · Catalogue · Review register

DOI: 10.1016/s0022-3697(71)80159-2

Source kind: measurement

Recorded technique: Normal-incidence reflectance, 1-26 eV, of fused and crystalline quartz (Fig. 1; from the author’s earlier note, ref. 10, Solid State Commun. 4, 73 (1966), philipp_1966, whose Fig. 1 has the same caption and 5 per cent offset), of evaporated SiO and SiO_x (x ~ 1.5) films and of electron-beam-evaporated amorphous Si films; Kramers-Kronig analysis (ref. 19) with the reflectance extrapolated above 26 eV, constrained by the transmission-derived absorption coefficients of Fig. 3 in the transparent regions (p. 1939). Films: SiO by rapid evaporation of silicon monoxide (30-80 A/s, p < 1e-5 Torr); SiO_x by slow evaporation (2-5 A/s) in oxygen near 1e-4 Torr; O to Si ratios not determined (p. 1937).

Materials in structured entries: None recorded.

Dataset quantities: None recorded.

Contents: 0 datasets; 0 formulas.

Curation notes#

Journal pages 1935-1945 = pdf pages 1-11. Identity checked against the first page. NOTHING IS TRANSCRIBED: the SiO2 data are in figures only, and the paper’s only table is out of scope.

WHAT THE PAPER HOLDS FOR SiO2 (figures, not digitised): - Fig. 1 (p. 1936): reflectance of crystalline and fused quartz against photon energy, ‘For clarity, the values for fused quartz have been lowered by 5 per cent’ (caption). - Fig. 3 (p. 1938): absorption coefficient against energy of amorphous Si, SiO, SiO_1.5 and SiO2 films, and (far right) crystalline SiO2. - Fig. 4 (p. 1939): reflectance of Si, SiO, SiO_1.5 and SiO2, ‘For clarity the ordinates have been displaced (see arrows)’ (caption). - Fig. 5 (p. 1939): epsilon_1 and epsilon_2 of the four materials from the Kramers-Kronig analysis. - Fig. 7 (p. 1941): epsilon_0,eff (Eq. (1), the sum rule on epsilon_2/E) as a percentage of its value integrated to 26 eV; ‘for each of these materials the value of epsilon_0,eff obtained by integration to 26 eV is close to the optical value epsilon_0’ (p. 1940); SiO2 ‘is essentially transparent’ below 9 eV. - Fig. 8 (p. 1942): n_eff (Eq. (2)), the effective number of electrons per SiO2 molecule: ‘For SiO2, the curve for n_eff is approaching 8 electrons per SiO2 molecule near 26 eV. There is no direct evidence that this plot will saturate near this value’ (p. 1941); the oxides’ reflectance falls ‘fairly fast’ above about 23 eV (p. 1942). For Si, n_eff approaches 4 electrons per atom; for SiO, about 6 per molecule. - Text (p. 1936): the density ratio of crystalline to fused quartz, 2.65/2.20 = 1.2, while ‘the polarizability per unit density for each form is nearly the same’.

RELATION TO philipp_1985. Palik’s handbook chapter (philipp_1985, Table X) is the first tabulation of these Kramers-Kronig results: its 11.2-6.0 eV n (tag [9]) cites this paper and Solid State Commun. 4, 73 (1966) (philipp_1966), ‘with a slight modification of Philipp’s results as described in Weinberg et al.’ (weinberg_1979 shifts Philipp’s data by +0.075 eV to align the first peak), and its 25-11.4 eV n and k are a smooth curve through Philipp’s and Lamy’s results. Those tables are curated there; nothing here would add to them without digitising.

OUT OF SCOPE. The unlabelled table on p. 1943 (tbl_eaef168b55cf): the statistical distribution of the five Si-centred tetrahedra, Si-(Si_y O_(4-y)), for SiO2, SiO_1.5, SiO, SiO_0.5 and Si (a structural model, not an optical quantity). The data for amorphous Si, SiO and SiO_x films (Figs. 2-6, 8) are figures only; no material is registered for them (none is needed).

Recorded bibliographic identity status: VALIDATED_WITH_WARNINGS. This concerns identification of the source; it does not establish the scientific correctness of its contents.

Datasets#

No datasets are recorded.

Formulas#

No formulas are recorded.

Corrections#

No dataset errata are recorded in this source record.

Formula corrections, where recorded, appear with their formulas above. Curation notes may also discuss corrections or unresolved interpretation. Consult the review register for the checks and decisions.